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  5. Pulsed laser deposition of boron and boron nitride thin film
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Pulsed laser deposition of boron and boron nitride thin film

Date Issued
August 1, 2011
Author(s)
Tang, Siwei  
Advisor(s)
Philip D Rack
Additional Advisor(s)
Thomas Meek
Charles Feigerle
Permanent URI
https://trace.tennessee.edu/handle/20.500.14382/31463
Abstract

This thesis focuses on the preparation parameter and characterization of boron and boron nitride thin film. System is built composing of designing the geometry, substrate and target holder, pumping parts and plasma generated parts. Experiments with various conditions have been tried and the optimized condition is found for the film growth rate. Many ways of characterization includes: X-ray diffraction, Scanning electron microscopy, Raman spectroscopy, Fourier transform infrared spectroscopy have been tried to identify the material composition.

Disciplines
Engineering
Materials Science and Engineering
Semiconductor and Optical Materials
Degree
Master of Science
Major
Materials Science and Engineering
Embargo Date
December 1, 2011
File(s)
Thumbnail Image
Name

0-Thesis_preface.docx

Size

24.97 KB

Format

Microsoft Word XML

Checksum (MD5)

241c30a4e74455b00018d2f113f28f84

Thumbnail Image
Name

Thesis.docx

Size

19.4 MB

Format

Microsoft Word XML

Checksum (MD5)

02038458e3953c3012feefe8f4eebdc4


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