Pulsed laser deposition of boron and boron nitride thin film
Date Issued
August 1, 2011
Author(s)
Advisor(s)
Philip D Rack
Additional Advisor(s)
Thomas Meek
Charles Feigerle
Abstract
This thesis focuses on the preparation parameter and characterization of boron and boron nitride thin film. System is built composing of designing the geometry, substrate and target holder, pumping parts and plasma generated parts. Experiments with various conditions have been tried and the optimized condition is found for the film growth rate. Many ways of characterization includes: X-ray diffraction, Scanning electron microscopy, Raman spectroscopy, Fourier transform infrared spectroscopy have been tried to identify the material composition.
Degree
Master of Science
Major
Materials Science and Engineering
Embargo Date
December 1, 2011
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