Electron attachment to perfluoro-n-hexane using the swarm method
Date Issued
August 1, 1980
Author(s)
Ghemati, Salem M.
Advisor(s)
L. G. Christophorou
Additional Advisor(s)
Solon Georghiou
Abstract
The results of a swarm study on the attachment of slow ≤ 2 eV electrons to perfluoro-n-hexane in high densities of N2 (500 ≤ PTOTAL ≤ 12,000 torr) and Ar (500 ≤ PTOTAL ≤ 17,000 torr), are presented and discussed. The pressure and energy dependence of the electron attachment rate, αw, is investigated. The attachment rate was found to be independent of n-C6F14 pressure and slightly dependent on PTOTAL. The unfolded attachment cross section using the attachment rates measured in N2 exhibited a strong resonance maximum at ~ 1 eV which presumably arises from a dissociative attachment process. The peak cross section values of the cross section so obtained were 1.02 X 10-17 cm2 at 0.02 eV and 6 X 10-17 cm2 at 1 eV. An estimate of 3 X 106 sec -1 torr -1 was determined for the thermal value of the electron attachment rate for n-C6F14. The present results were compared with existing electron beam data on lower members of the series CnF2n+2 and general conclusion drawn was: for saturated aliphatic perfluorocarbons, an increase in molecular size increases the electron attachment rate, and lowers the position of the NIR.
Degree
Master of Science
Major
Physics
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Thesis80G445.pdf
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1.54 MB
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